Development of Extreme Ultraviolet (EUV) Source
Development of high-power extreme ultraviolet (EUV) source is required by semiconductor lithography process. It is commonly realized that EUV is generated from high-temperature, high-density plasma which can be obtained by pulsed high-current discharge. In our institute, pulsed high-current generator has been developed for EUV source applications. It combines semiconductor switches with magnetic pulse compression in order to obtain repetitive operation and high-current capability. EUV source studies are being carried out by using this high-current generator.
Pulsed high-current generator for EUV source development