Output parameters: 3 MV, 460 kA, 50 ns Dimensions: 20 m long, 3 m width, 3.5 m high Yeas of completion: 1985
Structure of ETIGO-II
ETIGO-II is used for
１) Thin film deposition by pulsed ion-beam evaporation
２) Studies on pulsed ion-beam generated ablation plasma
３) High power microwave generation
